Following is an excerpt of some of equipment we now have available. Please keep in mind that equipment comes in and goes out practically daily. If you require any equipment which does not appear in our listing, please don´t hesitate to ask for it. We will be happy to send you a quotation with detailed information.

Convac, Cleaner Model CSE 9

For cleaning substrates with burnable medias
Item-No.: 13.30

RRTL, High pressure cleaner SC-12

The newly designed, versatile Reinraumtechnik Lanz the SC-12 is intended for cleaning substrates / wafers via high pressure. Various cleaning applications are possible for wafers/substrates, with a maximum size of 12”, via the built-in media and high pressure nozzles and DI-water heater.
Item-No.: 0.11

RRTL, Rinser/Dryer LRD

for wafers respectively masks up to 7"" with new controller STS-15-L
Item-No.: 0.8