Reinraumtechnik Lanz´s offer

Following is an excerpt of some of equipment we now have available. Please keep in mind that equipment comes in and goes out practically daily. If you require any equipment which does not appear in our listing, please don´t hesitate to ask for it. We will be happy to send you a quotation with detailed information.


Convac, Coater for Square Substrates Model 301G

 

Coater for Square Substrates, including GEAR-Set
Item-No.: 4.22

EVG, Mask aligner AL6-2 Back side aligner

 

Configured for Top and Backside Alignment - Manuell - Auto Alignment - for 6"/150mm wafers - 350W Lamphouse - UV400 Exposure Optics (365nm and 405nm) - 500 Watt Power Supply - 6"/150mkm Vacuum Chuck with Bottom Side Alignment Holes - 7"x7" Maskholder with 6" exposure area - Proximity, Soft Contact, Hard Contact, Vacuum Contact, Hard Contact with Vacuum, and Blanket Exposure can be used.

Substarte-parameters:


Substarte size 1-6". Thickness of substrate and mask:max 10mm

Mask-parameters:

Mask size: max. 7"

Algnment:

'Alignment range: X-Y-Z +/- 5mm rotation: +/- 3
all movements controlled by step motors and piezos'

Alignment accuracy:

'Standard-1,25mkm
Programmable movements: in the stepping mode: 1,25mkm-1000mkm (cursor keys) in scanning mode: 1µm/sec.-1000mkm/sec (joystick)'

Alignment possibilities:

first print - alignment OFF separation- adjustable in 1 mkm steps (5-99 mkm)

Contact pressure between mask and substrate:

adjustable from 1 Newton

Exposure possibilities:

softcontact, vacuumcontact, hardcontact, proximity

Microscope:

top side alignment: splitfield MS 251, bottom side alignment: splitfield MS 250

Lamphouse:

for wavelengths of 200-450 nm for power of 200-500W

Item-No.: 115

RRTL, Constant Power Supply CPS 350

 

Mercury Arc lamp power supply. Power Supply for photolithography exposure systems, like aligners and flood exposures. The constant power supply CPS 350 is designed for operating the Mercury short arc lamps HBO 350 W/S and HBO 350 W.
Item-No.: 0.10

RRTL, Constant Power Supply CPS 200

 

Mercury Arc lamp power supply. Power Supply for photolithography exposure systems, like aligners and flood exposures. The constant power supply CPS 350 is designed for operating the Mercury short arc lamps HBO 200 W/S and HBO 200 W.
Item-No.: 0.12

RRTL, Clustertool CT100 / CT150 / CT5060 / CT 105

 

Reinraumtechnik Lanz´s Cluster tool CT-100 is a modular Coater and/or Developer unit with one or two variable tracks. This is a compact plant which can be configurated to customer´s needs. The substrates are transported fully automatic by the handling system.
Item-No.: 0.15

RRTL, Substrat spiner EBS-8

 

The newly designed, versatile Reinraumtechnik Lanz spinner module with high torque 3-phase AC-motor and PWM servo controller. Depending upon the option selected, the spinner can be used for coating, developing or cleaning wafers and substrates. The optional built-in dispense arm allows for automated processing of single substrates.
Item-No.: 0.2

RRTL, Substrat spiner EBS-11

 

The popular Reinraumtechnik Lanz spinner with new electronics.This spinner is used for coating and developing ("puddle") of wafers and substrates. The optionalbuilt-in dispense arm allows for automated processing of single substrates, in conjunction with an optional dispense pump. User-friendly operation via touch panel. The program holds 60 recipes with 30 user-determined process cycles.
Item-No.: 0.7

Posted on 08.03.2010