Nanometrics, Film Thickness Measurement System Nanospec AFT Scanning UV 216 OS/2
"Film Thickness Measurement System Scanning UV 216 OS/2, for up to 8"" Wafers"
"Film Thickness Measurement System Scanning UV 216 OS/2, for up to 8"" Wafers"
Reinraumtechnik
Lanz´s reliable, new HMDS Oven for pre-programmed dehydration
and vapor deposition to generate photoresist adhesion. This newly
developed vapor prime oven is controlled via a PLC with an easy-to-use
touch panel.
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