Heraeus, Diffusion Oven RO 20/100
"for max. 4"" Wafer, up to 1000°C"
"for max. 4"" Wafer, up to 1000°C"
Reinraumtechnik
Lanz´s reliable, new HMDS Oven for pre-programmed dehydration
and vapor deposition to generate photoresist adhesion. This newly
developed vapor prime oven is controlled via a PLC with an easy-to-use
touch panel.
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