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RRTL, LRD Rinser/Dryer
for wafers respectively masks up to 7"" with new controller STS-15-L
Item no.: 0.8 Read full article
RRTL, LAK 300 Evaporation system
System: 560 x 700 x 1900 mm (w x d x h)
Chamber: 300 x 325 x 380 mm (w x d x h)
Thermal evaporator, 2 KVA with pneumatical shutter
Deposition controller with single quartz crystal sensor
Rotary with workholder (permanent rotation 360°)
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RRTL, CPS 200 Constant Power Supply
Power Supply for photolithography exposure systems, like aligners and flood exposures. The constant power supply CPS 200 is designed for operating the Mercury short arc lamps HBO 200 W/DC or similarThe constant power supply CPS 200 is built to operate the Mercury short arc lamps HBO 200 W/DC or similarThe constant power supply CPS 200 is built to operate the Mercury short arc lamps HBO 200 W/DC or similar.
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RRTL, Coater / Developer / Cleaner Spinner
Depending upon the option selected, the spinner can be used for coating, developing or cleaning wafers and substrates. The built-in dispense arm allows for automated processing of single substrates.
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RRTL, CPS 350 Constant Power Supply
Power Supply for photolithography exposure systems, like aligners and flood exposures. The constant power supply CPS 350 is designed for operating the Mercury short arc lamps HBO 350 W/S and HBO 350 W.The constant power supply CPS 350 is built to operate the Mercury short arc lamps HBO 350 W/S and HBO 350 W.The constant power supply CPS 350 is built to operate the Mercury short arc lamps HBO 350 W/S and HBO 350 W.
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RRTL, Cluster Tool CT100 Coater and/or Developer
Coater for negative and positive photo resists. Configu-ration for up to 3”/100 mm Wafer CT 100 can also be upgraded for up to 150mm wafers. Controlled via PLC and PC.
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RRTL, EBS 8 Substrat spiner
The newly designed, versatile Reinraumtechnik Lanz spinner module with high torque 3-phase AC-motor and PWM servo controller. Depending upon the option selected, the spinner can be used for coating, developing or cleaning wafers and substrates. The optional built-in dispense arm allows for automated processing of single substrates.
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RRTL, VTO Vacuum Drying Oven
adequate system for various vacuum processes, such as drying substrates in vacuum and by increased temperature, plasma processes, etc.
- easy-to-use oven with integrated PC control system
- chart recording
- through-the-wall design
- system can easily be adapted to customer´s requirements
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RRTL, VPO 50 Vacuum prime oven
PLC controlled – with touch panel
HMDS support with refillable glass cylinder
Temperature up to 170°C
Chamber dimensions: 350x350x420 mm (w x d x h) including stainless steel rod shelfs, height-adjustable
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RRTL, VPO 200 Vapor prime oven
Reinraumtechnik Lanz´s reliable, new HMDS Oven for pre-programmed dehydration and vapor deposition to generate photoresist adhesion. This newly developed vapor prime oven is controlled via a PLC with industrial PC and an easy-to-use touch panel.
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RRTL, HP 200 Hot plate
The newly designed, versatile Reinraumtechnik Lanz Hotplate HP 200, selectively with temperature or process controller, is intended for various thermal processes, in detail for tempering and baking substrates of different sizes.
By using the process controller, the operator is able to implement a variety of temperature heating ramps.
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RRTL, Expander
Semi-Automatic tool for expanding already processed die for easy and accurate pick and placement.
Item no.: 0.3 Read full article
Last update: 20.10.2011