Product	Details
CPS 350 - Constant Power Supply Power Supply for photolithography exposure systems, like aligners and flood exposures. The constant power supply CPS 350 is designed for operating the Mercury short arc lamps HBO 350 W/S and HBO 350 W.
AccuThermo AW 610 RTP System NEW RTP System for sbustrate sizes 4" to 6" single wager processing temperature range from 600°C up to 1250°C programmable ramp-up speed Petium computer with 17" LCD monitor Please download system´s datasheed for more technical details.
Vacuum Drying Oven VTO adequate system for various vacuum processes, such as drying substrates in vacuum and by increased temperature, plasma processes, etc. - easy-to-use oven with integrated PC control system - chart recording - through-the-wall design - system can easily be adapted to customer´s requirements
Substrate Spinner EBS-8x Spinner Module with high torque 3-phase AC-motor can be utilized as Coater, Developer or Cleaner for Substrates up to 8" square and Wafers up to 300mm dia.
Expander Semi-automatic tool for expanding already-processed die for easy and accurate pick and placement.
Vapor Prime Oven VPO 50 HMDS Oven for pre-programmed dehydration and vapor deposition to generate photoresist adhesion.
Hotplate HP 200 Hotplate HP 200 for various thermal processes, i.e. for baking and tempering substrates, wafer. Substrate size up to 200mm Dia or 150mm x 150mm square. Max. Temperature 200°C
Substrate Spinner EBS-11 Spinner Module can be used as Coater and/or Developer for Substrates up to 5" square and Wafers up to 150mm dia
Controller APS XXX APS pump stand controller is intended for various evaporation and sputtering systems
LAK 300 Evaporation System for laboratory and R&D, small and handy system. The system can be equipped with thermal evaporator, e-gun, glow discharge, substrate heaters, to name only a few possibilities.

Last update: April 24, 2008